Roughness and oxidation: application to NiO growth on Ni at 800C

Registro completo de metadados
MetadadosDescriçãoIdioma
Autor(es): dc.creatorHuntz, Anne Marie-
Autor(es): dc.creatorLefevre, B.-
Autor(es): dc.creatorCassino, Flávio Sandro Lays-
Data de aceite: dc.date.accessioned2019-11-06T13:25:53Z-
Data de disponibilização: dc.date.available2019-11-06T13:25:53Z-
Data de envio: dc.date.issued2012-12-05-
Data de envio: dc.date.issued2012-12-05-
Data de envio: dc.date.issued2000-
Fonte completa do material: dc.identifierhttp://hdl.handle.net/123456789/2004-
Fonte: dc.identifier.urihttp://educapes.capes.gov.br/handle/capes/555219-
Descrição: dc.descriptionThe changes with oxidation time of the oxide outer surface roughness, the oxide grain size and the oxidation rate constant kc for NiO growth on Ni were studied at 800°C in 1 atm oxygen. The roughness was determined by optical interferometry establishing 2D-profiles and 3D-images. Correlations were found between the variations of the oxide outer surface roughness or the kc values and the oxide grain size. These are attributed to the decrease of the oxide grain boundary density with time, which induces a decrease of the effective diffusion coefficient.-
Idioma: dc.languageen-
Direitos: dc.rightsO Periódico Materials Science and Engineering A concede permissão para depósito do artigo no Repositório Institucional da UFOP. Número da licença: 3311411337199.-
Palavras-chave: dc.subjectNiO roughness-
Palavras-chave: dc.subjectOxide grain size-
Palavras-chave: dc.subjectOxidation constant-
Palavras-chave: dc.subjectNickel oxidation-
Título: dc.titleRoughness and oxidation: application to NiO growth on Ni at 800C-
Aparece nas coleções:Repositório Institucional - UFOP

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