Mechanisms of arsenic removal from simulated surface water based on As (III) retention on thiol chelating resins.

Registro completo de metadados
MetadadosDescriçãoIdioma
Autor(es): dc.creatorDuarte, Graziele-
Autor(es): dc.creatorTeixeira, Mônica Cristina-
Autor(es): dc.creatorOlusegun, Sunday J.-
Autor(es): dc.creatorCiminelli, Virgínia Sampaio Teixeira-
Data de aceite: dc.date.accessioned2025-08-21T15:47:36Z-
Data de disponibilização: dc.date.available2025-08-21T15:47:36Z-
Data de envio: dc.date.issued2022-11-03-
Data de envio: dc.date.issued2022-11-03-
Data de envio: dc.date.issued2020-
Fonte completa do material: dc.identifierhttp://www.repositorio.ufop.br/jspui/handle/123456789/15759-
Fonte completa do material: dc.identifierhttps://www.sciencedirect.com/science/article/pii/S2215153221001070-
Fonte completa do material: dc.identifierhttps://doi.org/10.1016/j.enmm.2021.100532-
Fonte: dc.identifier.urihttp://educapes.capes.gov.br/handle/capes/1024204-
Descrição: dc.descriptionA novel system for arsenic speciation in the aqueous environment has been developed based on the high affinity of As(III) for the sulfhydryl groups present in thiol resins (R-S). The performance of tailor-made cartridges filled with the thiol resin was then compared with a commercial silica-based anion exchange cartridge with a qua- ternary ammonium group (R-N) typically used for As(V) speciation. Both were able to separate arsenic species efficiently, As(V) and As(III), within a broad pH range using flow rates of up to 5 ml min− 1 . The R-S resin was shown to be suitable for the inorganic arsenic speciation in aqueous systems containing calcium, magnesium, ferrous and ferric ions. The R-S selectivity for As(III) was affected only at sulfate or phosphate/As mass ratio > 500, in a behavior similar to R-N for As(V). The thiol resin’s selectivity for As(III) and its immobilization mechanism were investigated through X-ray Absorption Spectroscopy. At pH 5, each arsenic atom bounds to three sulfur atoms, with an As-S inter-atomic distance of 2.26 ± 0.01 Å, and a coordination number (CN) of 2.8 ± 0.3. The separation of the neutral As(III) species by a thiol resin presents itself as an alternative to the available anion exchange methods. The sorption of As(III) on the thiol resin followed a pseudo-second-order kinetic model and can be described by the Langmuir isotherm.-
Formato: dc.formatapplication/pdf-
Idioma: dc.languageen-
Direitos: dc.rightsrestrito-
Palavras-chave: dc.subjectArsenic speciation-
Palavras-chave: dc.subjectAdsorption mechanism-
Palavras-chave: dc.subjectIon exchange-
Palavras-chave: dc.subjectSulfhydryl-
Palavras-chave: dc.subjectX-ray absorption spectroscopy-
Título: dc.titleMechanisms of arsenic removal from simulated surface water based on As (III) retention on thiol chelating resins.-
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