Characterization of tellurium dioxide thin films obtained through the Pechini method

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Autor(es): dc.contributorUniversidade Estadual Paulista (UNESP)-
Autor(es): dc.contributorInstituto de Pesquisas Energéticas e Nucleares-
Autor(es): dc.creatorBataliotti, Murilo Dobri-
Autor(es): dc.creatorCosta, Francine Bettio-
Autor(es): dc.creatorMinussi, Fernando Brondani-
Autor(es): dc.creatorAraújo, Eudes Borges-
Autor(es): dc.creatorde Lima, Nelson Batista-
Autor(es): dc.creatorMoraes, João Carlos Silos-
Data de aceite: dc.date.accessioned2025-08-21T17:08:40Z-
Data de disponibilização: dc.date.available2025-08-21T17:08:40Z-
Data de envio: dc.date.issued2023-03-02-
Data de envio: dc.date.issued2023-03-02-
Data de envio: dc.date.issued2022-08-01-
Fonte completa do material: dc.identifierhttp://dx.doi.org/10.1007/s10971-022-05844-7-
Fonte completa do material: dc.identifierhttp://hdl.handle.net/11449/241877-
Fonte: dc.identifier.urihttp://educapes.capes.gov.br/handle/11449/241877-
Descrição: dc.descriptionTellurium dioxide (TeO2) thin films were deposited on silicon substrates through the Pechini method, after which they were heat treated at different temperatures. The heat treatment temperatures were defined from the thermogravimetry-differential scanning calorimetry (TG-DSC) data of the precursor gel. The effects of the heat treatment on the structural properties were investigated through X-ray diffraction (XRD), atomic force microscopy, and Raman spectroscopy. The TG-DSC data showed four different weight loss steps due to the reduction of telluric acid to tellurium, the removal of the excess ethylene glycol, the decomposition of citric acid, and the degradation of polyester. The XRD and Raman data showed the presence of the γ- and α-TeO2 phases in the films treated at 400–500 °C. Lattice parameters of the observed crystalline phases were determined by Rietveld refinement, with which it was possible to evaluate the crystallite size and microstrain using the Williamson-Hall method. The heat treatment temperature directly influenced the crystallite size and the surface roughness of the films, which showed similar behaviors with the temperature. [Figure not available: see fulltext.].-
Descrição: dc.descriptionDepartment of Physics and Chemistry São Paulo State University (UNESP), SP-
Descrição: dc.descriptionCenter for Materials Science and Technology Instituto de Pesquisas Energéticas e Nucleares-
Descrição: dc.descriptionDepartment of Physics and Chemistry São Paulo State University (UNESP), SP-
Formato: dc.format378-385-
Idioma: dc.languageen-
Relação: dc.relationJournal of Sol-Gel Science and Technology-
???dc.source???: dc.sourceScopus-
Palavras-chave: dc.subjectAtomic force microscopy-
Palavras-chave: dc.subjectRietveld refinement-
Palavras-chave: dc.subjectSol-gel-
Palavras-chave: dc.subjectTellurite dioxide-
Palavras-chave: dc.subjectThin Films-
Palavras-chave: dc.subjectX-ray diffraction-
Título: dc.titleCharacterization of tellurium dioxide thin films obtained through the Pechini method-
Tipo de arquivo: dc.typelivro digital-
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