Reactive sputtering deposition of Co3O4 films and an evaluation of its use as an electrochemical sensor for ascorbic acid

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MetadadosDescriçãoIdioma
Autor(es): dc.contributorUniversidade Estadual Paulista (UNESP)-
Autor(es): dc.contributorUniversidade Estadual de Londrina (UEL)-
Autor(es): dc.creatorAzevedo Neto, Nilton Francelosi-
Autor(es): dc.creatorAngelico, João C.-
Autor(es): dc.creatorda Silva Pelissari, Marcelo R.-
Autor(es): dc.creatorCamargo, Luan Pereira-
Autor(es): dc.creatorSimões, Rafael Plana-
Autor(es): dc.creatorDall’Antonia, Luiz Henrique-
Autor(es): dc.creatorDias da Silva, José Humberto-
Data de aceite: dc.date.accessioned2025-08-21T22:08:04Z-
Data de disponibilização: dc.date.available2025-08-21T22:08:04Z-
Data de envio: dc.date.issued2023-03-01-
Data de envio: dc.date.issued2023-03-01-
Data de envio: dc.date.issued2022-08-01-
Fonte completa do material: dc.identifierhttp://dx.doi.org/10.1007/s10854-022-08804-7-
Fonte completa do material: dc.identifierhttp://hdl.handle.net/11449/241479-
Fonte: dc.identifier.urihttp://educapes.capes.gov.br/handle/11449/241479-
Descrição: dc.descriptionCo3O4 films have been deposited using reactive DC magnetron sputtering onto fluorine-doped tin oxide (FTO) and fused silica (SiO2). X-ray diffraction measurements confirmed the spinel Co3O4 phase. The surface roughness of the films were 4 nm and 20 nm for SiO2 and FTO substrates, respectively, as measured by atomic force microscopy. Optical transmission spectra of Co3O4 films show strong absorption in the near-infrared and visible regions. The photoconductivity response of SiO2/Co3O4, using 405 nm excitation, measured at room temperature is much smaller than the observed at 10 K. The electrochemical activity of the FTO/Co3O4 for the oxidation reaction of the ascorbic acid (AA) was investigated by differential pulse voltammetry and chronoamperometric. A model for the oxidation, based on density functional theory calculations for the electronic structure of the AA, is proposed. The set of results show that the assembled FTO/Co3O4 electrode can be used as an alternative and remarkable-performance non-enzymatic device to ascorbic acid electrooxidation.-
Descrição: dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)-
Descrição: dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)-
Descrição: dc.descriptionDepartment of Physics São Paulo State University (UNESP), Bauru-
Descrição: dc.descriptionEngineering College Industrial Technical College São Paulo State University (UNESP), Bauru-
Descrição: dc.descriptionDepartment of Chemical State University of Londrina (UEL), Paraná-
Descrição: dc.descriptionDepartment of Bioprocess and Biotechnology São Paulo State University (UNESP), Bauru-
Descrição: dc.descriptionDepartment of Physics São Paulo State University (UNESP), Bauru-
Descrição: dc.descriptionEngineering College Industrial Technical College São Paulo State University (UNESP), Bauru-
Descrição: dc.descriptionDepartment of Bioprocess and Biotechnology São Paulo State University (UNESP), Bauru-
Descrição: dc.descriptionFAPESP: 2020/12356-8-
Descrição: dc.descriptionCNPq: 408340/2021-5-
Formato: dc.format19678-19692-
Idioma: dc.languageen-
Relação: dc.relationJournal of Materials Science: Materials in Electronics-
???dc.source???: dc.sourceScopus-
Título: dc.titleReactive sputtering deposition of Co3O4 films and an evaluation of its use as an electrochemical sensor for ascorbic acid-
Tipo de arquivo: dc.typelivro digital-
Aparece nas coleções:Repositório Institucional - Unesp

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