Multilayered TiO2/TiO2−x/TiO2 films deposited by reactive sputtering for photocatalytic applications

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Autor(es): dc.contributorUniversidade Estadual Paulista (UNESP)-
Autor(es): dc.contributorInstituto Tecnológico de Aeronáutica – ITA-
Autor(es): dc.creatorEscaliante, Lucas Caniati [UNESP]-
Autor(es): dc.creatorPereira, Andre Luis de Jesus-
Autor(es): dc.creatorAffonço, Lucas Jorge [UNESP]-
Autor(es): dc.creatorda Silva, Jose Humberto Dias [UNESP]-
Data de aceite: dc.date.accessioned2022-08-04T22:10:39Z-
Data de disponibilização: dc.date.available2022-08-04T22:10:39Z-
Data de envio: dc.date.issued2022-04-28-
Data de envio: dc.date.issued2022-04-28-
Data de envio: dc.date.issued2021-08-14-
Fonte completa do material: dc.identifierhttp://dx.doi.org/10.1557/s43578-021-00310-6-
Fonte completa do material: dc.identifierhttp://hdl.handle.net/11449/222042-
Fonte: dc.identifier.urihttp://educapes.capes.gov.br/handle/11449/222042-
Descrição: dc.descriptionMultilayered TiO2/TiO2−x/TiO2 films, deposited by twenty periodical interruptions of O2 flow during reactive sputtering deposition were submitted to photocatalytic tests and characterized. The O2 flow interruptions lasted 10 s, 38 s, 45 s, and 70 s, while the regular flow periods lasted 540 s. The photocatalytic tests were performed using UV irradiation from a mercury lamp and a solution of methylene blue dye. The best photocatalytic response was observed in samples corresponding to 10 s interruptions. The results show that the amount of degraded dye was increased by an average of 1.67 times in the interrupted flow sample as compared to the homogeneous TiO2 film deposited under similar conditions. The results show that this relatively simple deposition procedure can produce significant improvements to the photocatalytic activity of the TiO2-based catalysts. Graphic abstract: [Figure not available: see fulltext.]-
Descrição: dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)-
Descrição: dc.descriptionSchool of Sciences Graduate Program in Materials Science and Technology - POSMAT Universidade Estadual Paulista – UNESP-
Descrição: dc.descriptionPhysics Department Fundamental Sciences Division – IEF Instituto Tecnológico de Aeronáutica – ITA-
Descrição: dc.descriptionSchool of Sciences Graduate Program in Materials Science and Technology - POSMAT Universidade Estadual Paulista – UNESP-
Descrição: dc.descriptionFAPESP: 2017/18916-2-
Formato: dc.format3096-3108-
Idioma: dc.languageen-
Relação: dc.relationJournal of Materials Research-
???dc.source???: dc.sourceScopus-
Palavras-chave: dc.subjectCatalytic-
Palavras-chave: dc.subjectLayered-
Palavras-chave: dc.subjectSemiconducting-
Palavras-chave: dc.subjectSputtering-
Palavras-chave: dc.subjectThin film-
Título: dc.titleMultilayered TiO2/TiO2−x/TiO2 films deposited by reactive sputtering for photocatalytic applications-
Tipo de arquivo: dc.typelivro digital-
Aparece nas coleções:Repositório Institucional - Unesp

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