Nano-modification of Si-wafer surfaces using low-cost ambient air diffuse plasma

Registro completo de metadados
MetadadosDescriçãoIdioma
Autor(es): dc.contributorMasaryk University-
Autor(es): dc.contributorUniversidade Estadual Paulista (UNESP)-
Autor(es): dc.creatorHomola, Tomáš-
Autor(es): dc.creatorPrysiazhnyi, Vadym [UNESP]-
Autor(es): dc.creatorStupavská, Monika-
Data de aceite: dc.date.accessioned2022-08-04T22:05:29Z-
Data de disponibilização: dc.date.available2022-08-04T22:05:29Z-
Data de envio: dc.date.issued2022-04-28-
Data de envio: dc.date.issued2022-04-28-
Data de envio: dc.date.issued2015-01-01-
Fonte completa do material: dc.identifierhttp://dx.doi.org/10.1504/IJNM.2015.075226-
Fonte completa do material: dc.identifierhttp://hdl.handle.net/11449/220597-
Fonte: dc.identifier.urihttp://educapes.capes.gov.br/handle/11449/220597-
Descrição: dc.descriptionIn this paper, we demonstrated the cleaning and nano-oxidation of Si-wafer surfaces by atmospheric pressure plasma, generated in ambient air using diffuse coplanar surface barrier discharge. Plasma treatment for one second resulted in a significant reduction of water contact angle. The increase in wettability was observed and explained by chemical changes on the analysed Si-wafer surfaces. These changes were analysed by X-ray photoelectron spectroscopy which showed a considerable decrease in the presence of carbon and a significant increase of oxygen on the analysed surfaces.-
Descrição: dc.descriptionR and D Centre for Low-Cost Plasma and Nanotechnology Surface Modification Masaryk University, Kotláøská 267/2-
Descrição: dc.descriptionFaculty of Engineering Sao Paulo State University-
Descrição: dc.descriptionFaculty of Engineering Sao Paulo State University-
Formato: dc.format237-244-
Idioma: dc.languageen-
Relação: dc.relationInternational Journal of Nanomanufacturing-
???dc.source???: dc.sourceScopus-
Palavras-chave: dc.subjectDBD-
Palavras-chave: dc.subjectDiffuse plasma-
Palavras-chave: dc.subjectNano-modification-
Palavras-chave: dc.subjectSilicon wafer-
Palavras-chave: dc.subjectSurface treatment-
Título: dc.titleNano-modification of Si-wafer surfaces using low-cost ambient air diffuse plasma-
Tipo de arquivo: dc.typelivro digital-
Aparece nas coleções:Repositório Institucional - Unesp

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